Apparel – General structure – Trimmings
Patent
1999-06-02
2000-05-30
Oleksa, Diana
Apparel
General structure
Trimmings
2 69, 2115, 2DIG1, 40586, 428101, 428914, A41D 2708
Patent
active
060676604
ABSTRACT:
A method of applique and the resulting article is described that includes forming a first image (20) on a mesh-like material layer (18), forming a second image (24) on an underlying substrate (22), and attaching the mesh-like material layer to the substrate so that the first image overlays the second image. The first and second images are substantially the same images. In one embodiment, the mesh-like material layer is attached to the substrate such that the first image directly overlays the second image. In another embodiment, the mesh-like material layer is attached to the substrate such that the first image overlays the second image at a slight offset. By attaching the mesh-like material layer over the substrate in either of these ways, the resulting combined image appears three-dimensionalized.
REFERENCES:
patent: 2671902 (1954-03-01), Grue
patent: 4140563 (1979-02-01), Sernaker
patent: 4466136 (1984-08-01), Bottom et al.
patent: 4813081 (1989-03-01), Cliff et al.
patent: 4815149 (1989-03-01), Erhardt et al.
patent: 4837864 (1989-06-01), Thill
patent: 4999848 (1991-03-01), Oney
patent: 5005219 (1991-04-01), Diaz
patent: 5073222 (1991-12-01), Fry
patent: 5175888 (1993-01-01), Clark
patent: 5347658 (1994-09-01), Clark
patent: 5379461 (1995-01-01), Wilmers
patent: 5515542 (1996-05-01), Simmons
patent: 5544365 (1996-08-01), Mondy
patent: 5600850 (1997-02-01), Shannon
patent: 5618546 (1997-04-01), Wood et al.
patent: 5636385 (1997-06-01), Harrison
patent: 5737775 (1998-04-01), Schwartz
patent: 5840408 (1998-11-01), Giansetto
patent: 5858496 (1999-01-01), Fisher et al.
patent: 5933866 (1999-08-01), Fox
patent: 5943698 (1999-08-01), Blanks
patent: 5960476 (1999-10-01), Danzy
Moran Katherine
Oleksa Diana
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