Application of optical processing for growth of silicon dioxide

Details Application of optical processing for growth of silicon dioxide Application of optical processing for growth of silicon dioxide

1996-01-26

1997-06-17

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Electromagnetic or particulate radiation utilized

427255, 4272554, B05D 306

Patent

active

056395205

ABSTRACT:
A process for producing a silicon dioxide film on a surface of a silicon substrate. The process comprises illuminating a silicon substrate in a substantially pure oxygen atmosphere with a broad spectrum of visible and infrared light at an optical power density of from about 3 watts/cm.sup.2 to about 6 watts/cm.sup.2 for a time period sufficient to produce a silicon dioxide film on the surface of the silicon substrate. An optimum optical power density is about 4 watts/cm.sup.2 for growth of a 100.ANG.-300.ANG. film at a resultant temperature of about 400.degree. C. Deep level transient spectroscopy analysis detects no measurable impurities introduced into the silicon substrate during silicon oxide production and shows the interface state density at the SiO.sub.2 /Si interface to be very low.

REFERENCES:
patent: 4109030 (1978-08-01), Briska et al.
patent: 4181751 (1980-01-01), Hall et al.
patent: 4371587 (1983-02-01), Peters
patent: 4419385 (1983-12-01), Peters
patent: 4495218 (1985-01-01), Azuma et al.
patent: 4631199 (1986-12-01), Hall et al.
patent: 4702936 (1987-10-01), Maeda et al.
patent: 5009926 (1991-04-01), Fukuda
patent: 5028560 (1991-07-01), Tsukamoto et al.
patent: 5330935 (1994-07-01), Dobuzinsky et al.

Affiliated with

Also associated with

Rating

Application of optical processing for growth of silicon dioxide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Application of optical processing for growth of silicon dioxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Application of optical processing for growth of silicon dioxide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2156258