Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-07-29
1993-09-28
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, C23C 1435
Patent
active
052484025
ABSTRACT:
A sputtering system magnetron formed of an array of permanent magnets rotated in proximity to a plane of a target disposed in a vacuum chamber has an improved shape resembling a cross section of an apple. The magnetic path established between oppositely poled pairs of magnets is inturned in a stem region proximate to the axis of rotation for the array and has a pair of opposed lobes extending outward from the stem region in a generally semi-circular form. The lobes lead to and join each other in an indent region opposite the stem region. The maximum distance across the path between the lobes is about double the minimum distance across the path between the stem region and the indent region.
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Ballentine Paul H.
Heimanson Dorian
Stephens, II Alan T.
CVC Products Inc.
Weisstuch Aaron
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