Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2009-02-09
2011-12-27
Connolly, Patrick J (Department: 2877)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
08086021
ABSTRACT:
The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
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Japanese Office Action issued in Japanese Patent Application No. JP 2008-035106 dated Jul. 13, 2010.
Gunji Yasuhiro
Miyai Hiroshi
Ominami Yusuke
Connolly Patrick J
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
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