Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2007-03-15
2010-11-23
Nguyen, Nam X (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S227000, C205S096000, C205S103000, C205S104000, C205S105000, C205S102000
Reexamination Certificate
active
07837841
ABSTRACT:
Electrochemical plating (ECP) apparatuses with auxiliary cathodes to create uniform electric flux density. An ECP apparatus for electrochemical deposition includes an electrochemical cell with an electrolyte bath for electrochemically depositing a metal on a substrate. A main cathode and an anode are disposed in the electrolyte bath to provide a main electrical field. A substrate holder assembly holds a semiconductor wafer connecting the cathode. An auxiliary cathode is disposed outside the electrochemical cell to provide an auxiliary electrical field such that a flux line density at the center region of the substrate holder assembly substantially equals that at the circumference of the substrate holder assembly.
REFERENCES:
patent: 6140241 (2000-10-01), Shue et al.
patent: 6179983 (2001-01-01), Reid et al.
patent: 6224737 (2001-05-01), Tsai et al.
patent: 6228233 (2001-05-01), Lakshmikanthan et al.
patent: 6261433 (2001-07-01), Landau
patent: 6270647 (2001-08-01), Graham et al.
patent: 6350362 (2002-02-01), Geisler et al.
patent: 6402923 (2002-06-01), Mayer et al.
patent: 6562204 (2003-05-01), Mayer et al.
patent: 1685086 (2005-10-01), None
patent: 62103392 (1987-05-01), None
English Language abstract of JP 62-103392, published May 13, 2987.
Chinese language office action dated Sep. 9, 2010.
English language translation of abstract CN 1685086 (published Oct. 19, 2005).
Chen Kei-Wei
Cheng Mu-Han
Tsai Jian-Sin
Wang Ying-Lang
Nguyen Nam X
Taiwan Semiconductor Manufacturing Co. Ltd.
Thai Susan
Thomas Kayden Horstemeyer & Risley
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