Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-08-07
2000-10-17
Housel, James C.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118723, 20429801, 20429823, 20429831, C23C 1600, C23C 1400, C23F 102, C25B 900
Patent
active
061325503
ABSTRACT:
The apparatus according to the present invention is capable of maintain a plasma at relatively high pressure while preventing a window from being heated or sputtered by the plasma. The reaction chamber includes (1) an entrance window for guiding an electromagnetic wave such as a microwave or an RF to the reaction chamber, (2) a reaction room where film formation or etching for a substrate is performed by exciting a gas with the electromagnetic wave such as the microwave or the RF, and (3) an intermediate room arranged between the reaction room and the entrance window and having a pressure higher than that in the reaction chamber. The gas in the intermediate room is not excited with the electromagnetic wave such as the microwave or the RF.
REFERENCES:
patent: 4866346 (1989-09-01), Gaudreau et al.
patent: 4940015 (1990-07-01), Kobashi et al.
patent: 4987284 (1991-01-01), Fujimura et al.
patent: 5003152 (1991-03-01), Matsuo et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5242663 (1993-09-01), Shiomi et al.
patent: 5272360 (1993-12-01), Todoroki et al.
patent: 5389154 (1995-02-01), Hiroshi et al.
Grill, A. (Cold Plasma in Materials Fabrication: From Fundamentals to Applications). IEEE Press, 1994.
Oyo Buturi, vol. 64, No. 6, pp. 526-535, Plasma reactor and subject of control, published Jun. 1995 (with translation of pp. 526-528).
IEEE Press, Cold Plasma in Materials Fabrication From Fundamentals to Applications, by Alfred Grill, IBM Research Division, T.J. Watson Research Center, Yorktown Heights, New York, pp. 26-29 (1994).
Silicon Depostion on a Rotating Disk, by Richard Pollard and John Newman, Materials and Molecular Research Division, Lawrence Berkeley Laboratory and Department of Chemical Engineering, University of California, Berkeley, California, published Mar. 1980 (pp. 744-752).
Industrial Plasma Engineering vol. 1: Priciples, by J. Reece Roth, Department of Electrical and Computer Engineering, Unversity of Tennessee, Knoxville, Institute of Physics Publishing, Bristol and Philadelphia, published 1995 (pp. 484-501).
Housel James C.
Ryan V.
Sumitomo Electric Industries Ltd.
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