Apparatuses for conditioning surfaces of polishing pads

Abrading – Abrading process – With tool treating or forming

Reexamination Certificate

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Details

C451S007000, C451S072000, C451S443000, C451S449000

Reexamination Certificate

active

06902470

ABSTRACT:
The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.

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patent: 6012968 (2000-01-01), Lofaro
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patent: 6332835 (2001-12-01), Nishimura et al.
patent: 6439968 (2002-08-01), Obeng
patent: 6443816 (2002-09-01), Inoue et al.
patent: 6533647 (2003-03-01), Brunelli
patent: 6589878 (2003-07-01), Lorimer
patent: 6776691 (2004-08-01), Nishimura et al.

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