Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2011-03-15
2011-03-15
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
Lens or reflective image former testing
C356S515000, C356S521000
Reexamination Certificate
active
07907263
ABSTRACT:
The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.
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patent: 2006/0285124 (2006-12-01), Hill
patent: 2010/0110403 (2010-05-01), Ogasawara
Tsuneo Kanda et ala., 0.85NA ArF Exposure System and Performance, Proc. SPIE, vol. 5040 pp. 789-800 2003.
Mark Van De Kerkhof, et al., Full optical column characterization of DUV lithographic projection tools, Proc. SPIE 2004, vol. 5377 p. 1960-1970.
Kafai Lai et al., , New paradigm in Lens metrology for lithographic sacanner: evaluation and exploration, Proc. SPIE 2004, vol. 5377 p. 160-171.
Aizawa Michiko
Aoki Eiji
Kakuchi Osamu
Kuramoto Yoshiyuki
Canon Kabushiki Kaisha
Canon U.S.A. Inc. IP Division
Connolly Patrick J
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