Apparatuses and methods for nondestructive microwave...

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Distributive type parameters

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S637000

Reexamination Certificate

active

07339382

ABSTRACT:
Wet and dry film thickness can be measured non-invasively on structures, such as surfaces associated with vessels, aircraft and buildings, using calibrated microwave sensors. The film is measured by directing microwave energy toward the film. The microwave energy passes through the film and is reflected by a reflective or semi-reflective substrate surface below the film. Properties of the reflected wave are compared with properties of reflected waves that were passed through calibration samples of known thicknesses to determine the unknown thickness of the film. In some embodiments, one or more sensors are maintained at a fixed altitude above the conductive/semi-conductive substrate for measurement, and in other embodiments, one or more sensors are maintained at a fixed altitude above the film. In one embodiment, sensors are associated with a coating applicator, with a first sensor preceding the applicator and a second sensor following the applicator to measure the thickness of the film applied by the applicator by comparing measurements before and after coating.

REFERENCES:
patent: 4045727 (1977-08-01), Yu et al.
patent: 4702931 (1987-10-01), Falcoff
patent: 5038615 (1991-08-01), Trulson et al.
patent: 5539322 (1996-07-01), Zoughi et al.
patent: 5748003 (1998-05-01), Zoughi et al.
patent: 6005397 (1999-12-01), Zoughi et al.
patent: 6120833 (2000-09-01), Bonnebat et al.
patent: 6317651 (2001-11-01), Gerstenberger et al.
patent: 6462561 (2002-10-01), Bigelow et al.
patent: 6489741 (2002-12-01), Benov et al.
patent: 6522285 (2003-02-01), Stolarczyk et al.
patent: 6674292 (2004-01-01), Bray et al.
Qaddoumi , et al.; “Microwave Detection and Depth Determination of Disbonds in Low-Permittivity and Low-Loss Thick Sandwich Composites”; 1996; 8:51-63; Springer-Verlag NY Inc.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatuses and methods for nondestructive microwave... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatuses and methods for nondestructive microwave..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatuses and methods for nondestructive microwave... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3977947

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.