Coating processes – Spraying
Reexamination Certificate
2005-12-22
2009-02-03
Bashore, Alain L (Department: 1792)
Coating processes
Spraying
C427S427400, C427S101000, C427S384000
Reexamination Certificate
active
07485345
ABSTRACT:
Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
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Essien Marcelino
Giridharan Manampathy G.
King Bruce H.
Marquez Gregory J.
Renn Michael J.
Askenazy Philip D.
Bashore Alain L
Optomec Design Company
Peacock & Myers, P.C.
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