Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2011-08-02
2011-08-02
Tadesse, Yewebdar T (Department: 1713)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S062000, C118S063000, C118S500000, C118S641000, C118S642000, C239S102200, C239S338000
Reexamination Certificate
active
07987813
ABSTRACT:
Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
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Essien Marcelino
Giridharan Manampathy G.
King Bruce H.
Marquez Gregory J.
Renn Michael J.
Askenazy Philip D.
Optomec, Inc.
Peacock & Myers, P.C.
Tadesse Yewebdar T
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