Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2006-05-16
2006-05-16
Koch, George (Department: 1734)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S062000, C118S063000, C118S500000
Reexamination Certificate
active
07045015
ABSTRACT:
Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.
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Essien Marcelino
Hunter Lemna J.
King Bruce H.
Renn Michael J.
Askenazy Philip D.
Koch George
Myers Jeffrey D.
Optomec Design Company
Peasock Myers, P.C.
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