Apparatus with layered microwave window used in microwave plasma

Coating apparatus – Gas or vapor deposition – With treating means

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118 501, 219 1055A, 333 99PL, 333252, C23C 1648

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active

050387120

ABSTRACT:
An improved apparatus for the formation of a functional deposited film using a microwave plasma chemical vapor deposition process characterized in that a microwave transmissible dielectric material is used for the microwave introducing window, and the window has a structure wherein the dielectric material is divided into blocks of the same or different dielectric materials having a specific inductive capacity of more than 1.0. In this way it is possible to adjust not only the resonant frequency characteristics but also the electromagnetic resonant mode of the window to resonate with the microwave oscillation frequency so as to enhance microwave transmission.

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patent: 4688009 (1987-08-01), Ferguson et al.
patent: 4729341 (1988-03-01), Fournier et al.
patent: 4732761 (1988-03-01), Machida et al.
Grat, R. F., "Modern Dictionary of Electronics," Sixth edition, Indianapolis, IN, Howard W. Sams & Co., Inc., 1984, pp. 256 and 954.

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