Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-12-18
1991-08-13
Lawrence, Evan
Coating apparatus
Gas or vapor deposition
With treating means
118 501, 219 1055A, 333 99PL, 333252, C23C 1648
Patent
active
050387120
ABSTRACT:
An improved apparatus for the formation of a functional deposited film using a microwave plasma chemical vapor deposition process characterized in that a microwave transmissible dielectric material is used for the microwave introducing window, and the window has a structure wherein the dielectric material is divided into blocks of the same or different dielectric materials having a specific inductive capacity of more than 1.0. In this way it is possible to adjust not only the resonant frequency characteristics but also the electromagnetic resonant mode of the window to resonate with the microwave oscillation frequency so as to enhance microwave transmission.
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Grat, R. F., "Modern Dictionary of Electronics," Sixth edition, Indianapolis, IN, Howard W. Sams & Co., Inc., 1984, pp. 256 and 954.
Canon Kabushiki Kaisha
Lawrence Evan
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