Apparatus with axial gas distribution for vacuum coating substra

Details Apparatus with axial gas distribution for vacuum coating substra Apparatus with axial gas distribution for vacuum coating substra

1992-04-02

1994-03-01

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429807, 20429828, 20429835, 118719, 118730, C23C 1434

Patent

active

052904172

ABSTRACT:
A coating machine (1) has a carousel (5) with location seats (18, 19) for substrates (3) that are to be coated. Process chambers (8) are located in a circle coaxially to the carousel (5) outside of the carousel (5). All substrates (3) located in the process chambers (8) can be removed at the same time from the process chambers (8) and put down on the carousel (5) by means of substrate transfer devices (9). After turning the carousel (5) slightly, new substrates (3) can be transported simultaneously into the process chambers (8).

REFERENCES:
patent: 4886592 (1989-12-01), Anderle et al.
patent: 4943363 (1990-07-01), Zejda et al.
patent: 4969790 (1990-11-01), Petz et al.
patent: 4987856 (1991-01-01), Hey et al.

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