Apparatus using charged-particle beam

Details Apparatus using charged-particle beam Apparatus using charged-particle beam

1988-07-06

1990-04-17

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

250427, 2504922, G21G 100

Patent

active

049183583

ABSTRACT:
An emitter produces a beam of electrons or ions accelerated at a relatively high accelerating voltage. The beam is sharply focused by a condenser lens at the final stage. An electrostatic field for retarding the beam is produced between the lens at the final stage and a target on which the beam impinges. The retarding field lowers the landing energy of the beam. An auxiliary electrode which is maintained at substantially the same potential as the target is disposed between the lens and the target. A secondary electron detector is mounted between the auxiliary electrode and the target.

REFERENCES:
patent: 4084095 (1978-04-01), Wolfe
patent: 4710632 (1987-12-01), Ishitani et al.
patent: 4748327 (1988-05-01), Shinozaki et al.
patent: 4835399 (1989-05-01), Hosaka et al.
"Retarding Field Optics for Practical Electron Beam Lithography" by T. H. Newman and R. F. W. Pease, SPIE, vol. 471, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III (1984), pp. 25-30.

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