Apparatus to provide a vaporized reactant for chemical-vapor dep

Details Apparatus to provide a vaporized reactant for chemical-vapor dep Apparatus to provide a vaporized reactant for chemical-vapor dep

1988-03-07

1989-07-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118725, C23C 1600

Patent

active

048440060

ABSTRACT:
An apparatus to provide a vaporized reactant for chemical-vapor deposition is disclosed. The apparatus employs a heated quartz reactant reservoir, quartz lines, a quartz valve and, optionally, a purge system. The apparatus may also include a quartz refill reservoir and heating means for the quartz lines. The purge system may be a vacuum purge system.

REFERENCES:
patent: 4436674 (1984-03-01), McMenamin
patent: 4446817 (1984-05-01), Crawley
patent: 4568397 (1986-02-01), Hoke et al.
patent: 4596208 (1986-06-01), Wolfson et al.
patent: 4640221 (1987-02-01), Barbee et al.
patent: 4747367 (1988-05-01), Posa
patent: 4761269 (1988-08-01), Conger et al.
"Model 425-MCT MOCVD HgCdTe Epitaxial Reactor", Crystal Specialities, Inc. 1986, Portland Oregon.

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