Apparatus to deposit multilayer films

Details Apparatus to deposit multilayer films Apparatus to deposit multilayer films

1992-01-14

1993-08-31

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419211, 20429815, 20429828, C23C 1434

Patent

active

052405834

ABSTRACT:
The present invention discloses an apparatus to deposit thin films on a substrate. An ion beam produced by an ion gun, which is radio-frequency excited, impinges upon a target. The target is translatable laterally by a target holder to bring different target materials into contact with the ion beam. The targets are held at an angle to the ion beam. The target material sputtered off the target by collision with the ions is deposited on substrates held above the targets. The substrates are moved into and out of the path of the sputtered material by an unique rotating device for uniform deposition of the sputtered material.

REFERENCES:
patent: 4793908 (1988-12-01), Scott et al.
patent: 5064520 (1991-11-01), Miyake et al.

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