Apparatus to apply photoresist primer to a wafer

Details Apparatus to apply photoresist primer to a wafer Apparatus to apply photoresist primer to a wafer

1997-03-24

1998-02-10

Powell, William

Coating apparatus

Gas or vapor deposition

438780, 438948, H01L 2100

Patent

active

057164533

ABSTRACT:
An improved method and apparatus for applying a primer to a wafer surface prior to coating the wafer with photoresist is provided. The method comprises priming a wafer with HMDS, removing the wafer from the priming chamber, and closing the chamber. Next, the chamber, piping and primer source are evacuated. The bubbler canister, piping and wafer chamber are held at a pressure of about 15 inches H.sub.2 O while the priming tool is idle between wafer priming operations. By maintaining the vaporizer, piping and wafer chamber at a partial vacuum, the primer will be prevented from condensing and forming harmful droplets on the wafer surface. The invention prevents primer condensation from forming on the wafer, thus improving photolithographic yields and device yields.

REFERENCES:
patent: 5085729 (1992-02-01), Garza et al.
patent: 5505781 (1996-04-01), Omori et al.

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