Apparatus system and method for reducing contamination at the he

Gas separation: processes – Solid sorption – Inorganic gas or liquid particle sorbed

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553856, 95141, 96108, 96135, 96153, B01D 5304

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active

060105577

ABSTRACT:
The present specification discloses an apparatus for reducing contamination at the head-disc interface. The preferred embodiment of the invention involves a data storage system for use in an environment where gaseous contaminants are present. The gaseous contaminants have a vapor pressure and a chemical composition. The data storage system has a housing. To attract gaseous contaminants present within the housing interior, a material is disposed within the housing interior. This material creates a competitive absorption or adsorption site for the gaseous contaminants.

REFERENCES:
patent: 4418369 (1983-11-01), Applequist et al.
patent: 4489356 (1984-12-01), Farmer
patent: 4581668 (1986-04-01), Campbell
patent: 4657570 (1987-04-01), Gronholz et al.
patent: 4684510 (1987-08-01), Harkins
patent: 4857087 (1989-08-01), Bolton et al.
patent: 4863499 (1989-09-01), Osendorf
patent: 5030260 (1991-07-01), Beck et al.
patent: 5124856 (1992-06-01), Brown et al.
patent: 5447695 (1995-09-01), Brown et al.
patent: 5538545 (1996-07-01), Dauber et al.
patent: 5593482 (1997-01-01), Dauber et al.
patent: 5734521 (1998-03-01), Fukudome et al.

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