Apparatus on the carousel principle for coating substrates

Details Apparatus on the carousel principle for coating substrates Apparatus on the carousel principle for coating substrates

1988-05-20

1989-12-12

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118719, 118721, 118730, 414221, 414223, C23C 1456

Patent

active

048865923

ABSTRACT:
A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other. The step size of the drive (36) on the one hand, and the angular position of each coating station (10 and 11, respectively) with respect to the air lock station associated with it (8 and 9, respectively) with reference to the axis of rotation of the substrate holder (6) on the other hand, are selected such that one and the same coating station (10 and 11, respectively), through the step-wise movement of a particular substrate pickup (63), is associated in each case with one and the same air lock station (8 and 9, respectively).

REFERENCES:
patent: 4733631 (1988-03-01), Boyarsky et al.
patent: 4808291 (1989-02-01), Denton et al.

Affiliated with

Also associated with

Rating

Apparatus on the carousel principle for coating substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus on the carousel principle for coating substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus on the carousel principle for coating substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2120206