Apparatus of formation of chemically amplified resist pattern

Details Apparatus of formation of chemically amplified resist pattern Apparatus of formation of chemically amplified resist pattern

1995-06-06

1997-12-02

Snay, Jeffrey

Coating apparatus

Gas or vapor deposition

With treating means

118 50, 118 64, 118 72, C23C 1600

Patent

active

056931450

ABSTRACT:
A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.

REFERENCES:
patent: 4693211 (1987-09-01), Ogami et al.
patent: 4870923 (1989-10-01), Sugimoto
patent: 4924800 (1990-05-01), Tanaka
patent: 5297910 (1994-03-01), Yoshioka et al.
patent: 5383970 (1995-01-01), Asaba et al.
patent: 5401316 (1995-03-01), Shiraishi et al.
patent: 5505781 (1996-04-01), Omori et al.
Lamola et al., "Chemically Amplified Resists", Solid State Technology 53-60 (Aug. 1991).

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