Apparatus including a focused UV light source for non-contact me

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – With rotor

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324 96, 356369, 156643, G01R 1900, G01R 3100

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active

049671529

ABSTRACT:
An apparatus which is used for non-contact electrical measurement and physical alteration of certain characteristics and properties of electronic conductor devices. The apparatus includes a focused source of ultraviolet light which is capable of micron and sub-micron resolution.
In the measurement mode the apparatus measures the energy of electrons ejected from a measurement site by the UV beam. This measurement is accomplished at a nulling/repelling device. In the alteration mode, the focused UV light beam interacts with various compounds, for example chemical gases, to create a selective reaction at specific locations at the surface of the device being operated upon.
The measurement function can be related to voltage, current, temperature or the like and may be either qualitative or quantitative while being made in a non-contact basis.

REFERENCES:
patent: 3880524 (1975-04-01), Dill et al.
patent: 3985447 (1976-10-01), Aspnes
patent: 4355278 (1982-10-01), Burns et al.
patent: 4394237 (1983-07-01), Donnelly et al.
patent: 4637726 (1987-01-01), Walker et al.
patent: 4653924 (1987-03-01), Itonaga et al.
patent: 4668337 (1987-05-01), Sekine et al.
patent: 4681449 (1987-07-01), Bloom et al.
patent: 4695162 (1987-09-01), Itonaga et al.
patent: 4698587 (1987-10-01), Burns et al.
patent: 4703260 (1987-10-01), Beha et al.
"Signal Level Regulation and Dark Current Compensation for Wavelength-Scanning Ellipsometer", by Hanes et al, IBM Tech. Disc. Bull., vol. 21, #2, 7/78, pp. 855-856.
"A Method of Detecting Hot Spots on Semiconductor Using Liquid Crystals", by Hiatt, Reliability Physics, 19th Annual Proc., 4/81, pp. 130-133.
"Simple Technique for Very Thin SiO.sub.2 Film Thickness Measurements", by Pliskin et al, Applied Phys. Lett., vol. 11, No. 8, pp. 257-259, 10/67.

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