Apparatus having reduced mechanical forces for supporting high m

Details Apparatus having reduced mechanical forces for supporting high m Apparatus having reduced mechanical forces for supporting high m

1989-02-17

1991-02-12

DeMeo, Palmer C.

Electric lamp and discharge devices

With magnetic device

For generating plural fields

31323131, 31323141, 31511171, 335216, 376137, 376139, 376121, H05H 110, H01J 150

Patent

active

049926969

ABSTRACT:
The present invention identifies several configurations of conducting elements capable of supporting extremely high magnetic fields suitable for plasma confinement, wherein forces experienced by the conducting elements are significantly reduced over those which are present as a result of the generation of such high fields by conventional techniques. It is anticipated that the use of superconducting materials will both permit the attainment of such high fields and further permit such fields to be generated with vastly improved efficiency.

REFERENCES:
patent: 4430600 (1984-02-01), Sheffield et al.
patent: 4650631 (1987-03-01), Knorr
patent: 4808954 (1989-02-01), Ito
L. J. Campbell et al., "Stationary Configurations of Point Vortices and Other Logarithmic Objects in Two Dimensions", Phys. Rev. Lett. 58, 670 2/87.
James B. Kadtke et al., "Method for Finding Stationary States of Point Vortices", Phys. Rev. A 36, 4360 11/87.

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