Apparatus having a vacuum chamber

Details Apparatus having a vacuum chamber Apparatus having a vacuum chamber

1991-05-30

1993-04-27

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429825, C23C 1434

Patent

active

052059189

ABSTRACT:
An apparatus having a vacuum chamber is provided which comprises a vacuum chamber that can hold a pressure therein at a pressure different from the outside pressure, a load-lock chamber formed at a portion of the vacuum chamber, for transferring in and out an object between the outside and the vacuum chamber while holding the pressure in the vacuum chamber at a pressure different from the outside pressure, and a piping apparatus having valve mechanism, which performs the intake and exhaust of gas with respect to the load-lock chamber. The piping apparatus comprises a passage formed in the wall of the vacuum chamber, the passage communicating with the load-lock chamber and being exposed to the outer wall of the upper lid so as to be connected to means for inhaling and exhausting gas, valve members disposed on the outer wall, for directly opening and closing the passage, and means for actuating the valve members. The passage is incorporated in the wall of the vacuum chamber, so that the entire apparatus can be small-sized and the conductance with respect to the gas-flow in the passage can be significantly increased.

REFERENCES:
patent: 3981791 (1976-09-01), Rosvold
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4820106 (1989-04-01), Walde e al.
patent: 4886592 (1989-12-01), Anderle et al.
Balzers Brochure, "Compact Disc Sputter System", (no date available). 4th AEJ Forum on Vacuum Equipment Industry (Nov. 21, 1989), Contamination Control in Vacuum Systems: Venting and Pumping, Strasser, G. et al.
Singulus Catalog "A Family of Single Disc Metallizing Systems".

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