Apparatus for writing patterns in a layer on a substrate by mean

Details Apparatus for writing patterns in a layer on a substrate by mean Apparatus for writing patterns in a layer on a substrate by mean

1980-06-09

1982-06-08

Truhe, J. V.

Electric heating

Metal heating

By arc

219121EJ, 219121LX, 2504923, B23K 1500

Patent

active

043341390

ABSTRACT:
An apparatus is described for writing patterns in a layer on a substrate by using a beam of electrically-charged particles. The apparatus is provided with an optical height-measuring system for determining a deviation between the desired and the actual position of the surface to be inscribed relative to the charged particle lens system. The deviation can be measured accurately and continuously without the use of additional markers on the substrate.

REFERENCES:
patent: 3291959 (1966-12-01), Schleich et al.
patent: 3648048 (1972-03-01), Cahan et al.
patent: 3902036 (1975-08-01), Zaleckas
patent: 4145597 (1979-03-01), Yasuda
IEEE Transactions on Electron Devices, vol. ED-22, No. 7, Jul. 1975, pp. 376-384, "An Electron Beam Maskmaker", by Beasley et al.
Laser Focus; Mar. 1976, pp. 38-40; "Lateral-Effect Photodiodes", by Brian O. Kelly.
Proceedings of the Society of Photo-Optical Instrumentation Engineers, vol. 221, Semiconductor Microlithography V; Mar. 17-18, 1980, pp. 2-8; "Step and Repeat Wafer Imaging", by S. Wittekoek.

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