Coating apparatus – Gas or vapor deposition – Work support
Patent
1993-08-30
1994-12-13
McFarlane, Anthony
Coating apparatus
Gas or vapor deposition
Work support
118726, 211 41, 437247, B05C 1302
Patent
active
053726499
ABSTRACT:
Apparatus for counterweighting a diffusion furnace cantilever arm for processing silicon wafers which has conventional slotted quartz boats for receiving silicon wafers wherein certain substitutes for said conventional quartz boats are constructed so as to be dummy loads which have the weight and dimensions of a filled quartz boat, but in which no silicon wafers are mounted. Other quartz boats have slots for a particular number of silicon wafers, but the remaining portion of the boat does not receive any wafers, and the boat has the weight and dimensions equivalent to a filled quartz boat. By combining the various boats on the cantilever arm a standard weight can be obtained.
REFERENCES:
patent: 4484538 (1984-11-01), Sarkozy et al.
patent: 4579609 (1986-04-01), Reif et al.
patent: 4653650 (1987-03-01), Schulke
patent: 4699805 (1987-10-01), Seelbach et al.
patent: 4822756 (1989-04-01), Hirayama
McFarlane Anthony
Sony Electronics Inc.
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