Apparatus for washing semiconductor wafers

Details Apparatus for washing semiconductor wafers Apparatus for washing semiconductor wafers

1976-12-07

1978-05-30

Bleutge, Robert L.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134 25A, 134199, B08B 302

Patent

active

040921760

ABSTRACT:
An apparatus for washing semiconductor wafers is disclosed which comprises a washing tub, a basket holding semiconductor wafers to be washed and placed in the washing tub, nozzles provided above and below the basket respectively for constantly squirting a washing liquid over the wafers, and a vent provided below the basket for periodically draining the waste liquid.

REFERENCES:
patent: 2632452 (1953-03-01), Spitzer
patent: 3346000 (1967-10-01), Cushing
patent: 3373752 (1968-03-01), Inoue
patent: 3389712 (1968-06-01), John
patent: 3594230 (1971-07-01), Kierner
patent: 3893869 (1975-07-01), Mayer et al.
patent: 3923072 (1975-12-01), Beaud

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