Apparatus for washing semiconductor materials

Details Apparatus for washing semiconductor materials Apparatus for washing semiconductor materials

1991-04-24

1993-03-02

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Plural, separate, work treating or holding receptacles or...

134 941, 1341021, 134201, 134902, B08B 304

Patent

active

051900645

ABSTRACT:
An apparatus for semiconductor wafers is disclosed which comprises a plurality of washing tanks for semiconductor wafers, air duct means defining blowing ports for discharging a flow of air over the washing tank, suction port means disposed opposite the blowing ports to remove the air after passing over the washing tank. And also the apparatus comprises ionizer means mounted on at least one side of the washing tank to ionize air flowing over the washing tank. Thus ionized air serves to neutralize electrostatic charge on surfaces of semiconductor wafers to thereby prevent dust or particles from sticking to the wafer surfaces.

REFERENCES:
patent: 4132567 (1979-01-01), Blackwood
patent: 4429983 (1984-02-01), Cortellino et al.
patent: 4520834 (1985-06-01), DiCicco
patent: 4777970 (1988-10-01), Kusuhara
patent: 4827954 (1989-05-01), Layton
patent: 4838979 (1989-06-01), Nishida et al.

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