Brushing – scrubbing – and general cleaning – Machines – Brushing
Reexamination Certificate
1999-06-16
2001-01-16
Spisich, Mark (Department: 1744)
Brushing, scrubbing, and general cleaning
Machines
Brushing
C015S088200, C015S102000
Reexamination Certificate
active
06173468
ABSTRACT:
BACKGROUND OF THE INVENTION
The present invention relates to a method and apparatus for washing both surfaces of a substrate such as a semiconductor wafer and an LCD (liquid crystal device) substrate.
In the manufacturing process of a semiconductor device, a photolithography technology is employed for forming a circuit, an electrode pattern, etc. on a semiconductor wafer. In the photolithography technology, a semiconductor wafer is coated with a photoresist solution. Then, the resist coating film is exposed to light, followed by a developing treatment with a developing solution. It should be noted that, before a series of the resist processing noted above, a front surface of the wafer which is to be coated with a resist solution is washed in order to prevent defect occurrence in the circuit pattern and short-circuiting of the wiring layers. It is also necessary to wash a back surface of the wafer in order to prevent mis-focussing in the light-exposure step and particle generation.
It was customary in the past to use a scrubbing device for brushing both surfaces of a semiconductor wafer, while supplying a washing liquid to the wafer, for washing the wafer. In general, the washing device of this type includes a front surface washing unit, a back surface washing unit, a wafer reversion unit, a heating unit and a cooling unit, which are arranged to have a transfer path sandwiched therebetween. When the washing device is used for washing a semiconductor wafer, the wafer is successively transferred by a transfer mechanism into each of the front surface washing unit, etc. in accordance with a predetermined recipe, thereby applying predetermined treatments to the wafer.
In the washing treatment of this type, however, a wide range of applicability which permits application to different specifications required by various users is required in, for example, the drying treatment. It follows that it is insufficient to apply a washing treatment to a substrate in accordance with a single recipe.
BRIEF SUMMARY OF THE INVENTION
An object of the present invention is to provide a method and apparatus for washing both surfaces of a substrate, which are capable of coping with various washing specifications.
According to a first aspect of the present invention, there is provided a method for washing both surfaces of a substrate, comprising:
(a) a first washing step for washing a front surface of a substrate, which is kept rotated, by bringing a scrubbing member into contact with the front surface of the substrate while supplying a washing liquid onto the front surface;
(b) a second washing step for washing a back surface of the substrate, which is kept rotated, by bringing a scrubbing member into contact with the back surface of the substrate while supplying a washing liquid onto the back surface;
(c) a heating step for drying under heat the wet surfaces of the substrate;
(d) a recipe determining step for determining whether the heating step (c) is performed twice, i.e., at a period between the first washing step (a) and the second washing step (b) and at a period after the second washing step (b), respectively, whether the heating step (c) is performed only once after the second washing step (b), or whether the heating step (c) is not performed; and
(e) a conducting step for performing or not performing the heating step (c) in accordance with the recipe determined in the recipe determining step.
According to a second aspect of the present invention, there is provided a method for washing both surfaces of a substrate, comprising:
(A) a first washing step for washing a front surface of a substrate, which is kept rotated, by bringing a scrubbing member into contact with the front surface of the substrate while supplying a washing liquid onto the front surface;
(B) a second washing step for washing a back surface of the substrate, which is kept rotated, by bringing a scrubbing member into contact with the back surface of the substrate while supplying a washing liquid onto the back surface;
(C) a heating step for drying under heat the wet surfaces of the substrate;
(D) a first recipe determining step for determining whether the heating step (C) is performed twice, i.e., at a period between the first washing step (A) and the second washing step (B) and at a period after the second washing step (B), respectively, whether the heating step (C) is performed only after the second washing step (B), or whether the heating step (C) is not performed;
(E) a conducting step for performing or not performing the heating step (C) in accordance with the recipe determined in the recipe determining step;
(F) a second recipe determining step for determining whether or not the front surface of the substrate should be irradiated with an ultraviolet light before the first washing step (A); and
(G) an ultraviolet light irradiation step for irradiating the front surface of the substrate with an ultraviolet light in accordance with the recipe determined in the second recipe determining step (D).
According to a third aspect of the present invention, there is provided an apparatus for washing both surfaces of a substrate, comprising: a spin chuck for holding and rotating a substrate; a first washing section in which a scrubbing member is brought into contact with a front surface of a substrate, which is kept rotated, while supplying a washing liquid onto the front surface of the substrate for washing the front surface; a second washing section in which a scrubbing member is brought into contact with a back surface of the substrate, which is kept rotated, while supplying a washing liquid onto the back surface of the substrate for washing the back surface; a heating section for drying under heat the wet substrate; a transfer arm mechanism for transferring the substrate into each of the first washing section, the second washing section, and the heating section; a recipe controller for controlling the first and second washing sections to permit the substrate to be washed in the second washing section after the substrate washing in the first washing section, and for determining whether the substrate should be dried twice in the heating section, i.e., between the washing in the first washing section and the washing in the second washing section and after the washing in the second washing section, respectively, whether the substrate should be dried only once after the washing in the second washing section, or whether the substrate should not be dried in the heating section; and control means for controlling the heating in the heating section on the basis of the recipe determined in the recipe controller.
According to a fourth aspect of the present invention, there is provided an apparatus for washing both surfaces of a substrate; comprising: an ultraviolet light irradiation section equipped with ultraviolet light irradiating means for irradiating a front surface of a substrate with an ultraviolet light; a spin chuck for holding and rotating a substrate; a first washing section in which a scrubbing member is brought into contact with a front surface of a substrate, which is kept rotated, while supplying a washing liquid onto the front surface of the substrate for washing the front surface; a second washing section in which a scrubbing member is brought into contact with a back surface of the substrate, which is kept rotated, while supplying a washing liquid onto the back surface of the substrate for washing the back surface; a heating section for drying under heat the wet substrate; a transfer arm mechanism for transferring the substrate into each of the first washing section, the second washing section, and the heating section; a recipe controller for controlling the first and second washing sections to permit the substrate to be washed in the second washing section after the substrate washing in the first washing section, for determining whether an ultraviolet light irradiation should be performed by the ultraviolet light irradiation means before the washing in the first washing section, and for determining whether the substrate shoul
Matsuyama Yuji
Yonemizu Akira
Oblon, Spivak, McClelland, Maier & Neustadt, P.C
Spisich Mark
Tokyo Electron Limited
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