Apparatus for wafer cleaning with rotation

Details Apparatus for wafer cleaning with rotation Apparatus for wafer cleaning with rotation

1994-07-01

1996-05-28

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

1341021, 1341041, 134111, 134138, 134186, 134902, B08B 312, B08B 1102

Patent

active

055202055

ABSTRACT:
A method and apparatus for a wafer cleaner using a rotation mechanism. Wafers are placed into a carrier 3 having grooves to maintain a spacing between the wafers. The carrier 3 and wafers are placed into a tank 1 with a cleaning solution. Nozzles 11 are used to direct pressurized solution against the wafers causing them to rotate within the carrier. In another embodiment, the tank 1 includes a megasonic transducer 16. In the second embodiment, the wafers are rotated while the megasonic transducer 16 is producing megasonic energy. The rotation of the wafers causes the cleaning solution and the megasonic energy to act on the wafers uniformly, and further exposes the edges of the wafers directly to the cleaning solution and the megasonic energy, thereby enhancing particle removal from the wafers. Other embodiments are provided.

REFERENCES:
patent: 4209342 (1980-06-01), Workman
patent: 4753258 (1988-06-01), Aigo
patent: 4980300 (1990-12-01), Miyashita et al.
patent: 5090432 (1992-02-01), Bran

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