Apparatus for vaporizing and supplying a material

Details Apparatus for vaporizing and supplying a material Apparatus for vaporizing and supplying a material

1998-09-23

2000-12-05

Simmons, David A.

Gas and liquid contact apparatus

Contact devices

Atomizer type

261 81, 261138, 261DIG65, B01F 304

Patent

active

061555401

ABSTRACT:
An apparatus for vaporizing a liquid material and supplying the material in a gas phase, in which a liquid material for CVD is introduced into a vaporizer at a controlled flow rate, atomized by an ultrasonic atomizing device disposed at the inside or the outside of the vaporizer, heated by a circular flow of a carrier gas and vaporized. When a liquid material for CVD is supplied to a CVD apparatus in the production of semiconductors, the concentration of the material is controlled easily in the vaporization, the concentration of the material in the gas can be changed quickly in response with the change in the flow rate of the material, decomposition of the material does not occur and the operating condition of a CVD apparatus is not restricted.

REFERENCES:
patent: 4310474 (1982-01-01), Iyengar
patent: 4335804 (1982-06-01), Bardin et al.
patent: 5173274 (1992-12-01), Owen
patent: 5372754 (1994-12-01), Ono

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