Apparatus for vapor deposition

Details Apparatus for vapor deposition Apparatus for vapor deposition

1991-05-13

1993-06-29

Bueker, Richard

Coating processes

Coating by vapor, gas, or smoke

Plural coatings applied by vapor, gas, or smoke

118724, 118725, C23C 1600

Patent

active

052233057

ABSTRACT:
An apparatus for vapor deposition including a vapor deposition section to which at least one semiconductor material supply passage and at least one alkoxide material supply passage are connected, first heating means provided for the vapor deposition section and capable of maintaining the temperature thereof higher than that of the alkoxide supply passage, second heating means provided for the semiconductor material supply passage and capable of maintaining the temperature thereof higher than that of the vapor deposition section, and third heating means provided for the alkoxide material supply passage and capable of maintaining the temperature thereof constant, and a process for continuously forming a multilayered film on a substrate.

REFERENCES:
patent: 5074954 (1991-12-01), Nishizawa
patent: 5140939 (1992-08-01), Valentian

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