Apparatus for use with analytical measuring instruments using el

Radiant energy – Supported for nonsignalling objects of irradiation

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378 79, 378161, 356244, H01J 3720

Patent

active

053509234

ABSTRACT:
A method and apparatus for use in performing non-contact analytical evaluation of a semiconductor wafer, which needs to be kept clean, to be performed outside of clean room facilities. The apparatus maintains a clean environment surrounding the semiconductor wafer and a portion of the apparatus is substantially transparent to a probe beam of electromagnetic radiation such as X-rays and visible light. The invention substantially overcomes the expenses associated with locating analytical test equipment for testing semi-conductor wafers within clean room facilities.

REFERENCES:
patent: 3973120 (1976-08-01), Kessels
patent: 4115689 (1978-09-01), Won
patent: 5161179 (1992-11-01), Suzuki et al.
patent: 5181233 (1993-01-01), Rink et al.

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