Apparatus for use in examining the lattice of a semiconductor wa

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250280, G01N 2320

Patent

active

040781755

ABSTRACT:
An improved apparatus for examining the crystal lattice of a semiconductor wafer utilizing x-ray diffraction techniques. The apparatus is employed in a method which includes the step of recording the image of a wafer supported in a bent configuration conforming to a compound curve, produced through the use of a vaccum chuck provided for an x-ray camera while the entire surface thereof is illuminated simultaneously by a beam of incident x-rays which are projected from a distant point-source and satisfy conditions of the Bragg Law for all points on the surface of the wafer.

REFERENCES:
patent: 2559972 (1951-07-01), Kerkpatrick
patent: 2585740 (1952-02-01), Claassen
patent: 2853617 (1958-09-01), Berreman

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