Apparatus for uniformly heating a substrate

Details Apparatus for uniformly heating a substrate Apparatus for uniformly heating a substrate

1996-12-27

1999-01-12

Walberg, Teresa J.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

118724, 118728, 392418, 438799, H01L 2102, H05B 322, F27B 514

Patent

active

058594086

ABSTRACT:
Support 7 is uniformly heated from underneath by an annular heater 8 having a vertically adjustable cooling disc 20 in the middle. This arrangement gives a very uniform temperature profile diametrically across the top of the support 7, useful in the production of semiconductor components 10 which are consistently heat treated wherever they are placed on the support 7.
Support 7 is rotated and may be subjected to microwave irradiation from an overhead generator 3.

REFERENCES:
patent: 4609037 (1986-09-01), Wheeler et al.
patent: 4859832 (1989-08-01), Uehara et al.
patent: 5044943 (1991-09-01), Bowman et al.
patent: 5050770 (1991-09-01), Mahawili
patent: 5059770 (1991-10-01), Mahawili
patent: 5091217 (1992-02-01), Het et al.
patent: 5338940 (1994-08-01), Takeyama
patent: 5635093 (1997-06-01), Arena et al.
"Organo-metal CVD Device," Jananese patent document `A` abstract w/figure, #05-221790, Aug. 1993.

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