Apparatus for uniformly heating a substrate

Details Apparatus for uniformly heating a substrate Apparatus for uniformly heating a substrate

1982-07-12

1984-09-11

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118718, 219342, 219352, C23C 1310

Patent

active

044703694

ABSTRACT:
Apparatus for developing a substantially uniform temperature distribution across the entire transverse width of a relatively thin, relatively large area substrate onto which a plurality of amorphous semiconductor layers will be deposited in a glow discharge deposition chamber. The apparatus includes a plurality of spaced heating elements, the filaments of which are suspended above and angled relative to the plane of the substrate so as to direct radiation onto that portion of the substrate which loses heat at the greatest rate with at least the same intensity as, and preferably greater intensity than, radiation is directed onto those portions of the substrate which lose heat at lesser rates. By establishing the greatest intensity of radiation adjacent that portion of the substrate which most readily loses heat, a uniform distribution of temperature across the transverse width of the substrate may be achieved.

REFERENCES:
patent: 3180973 (1965-04-01), Wanielista et al.
patent: 3275799 (1966-09-01), Meltzer
patent: 3471682 (1969-10-01), Hisey et al.
patent: 3956612 (1976-05-01), Ballard et al.
patent: 4369730 (1983-01-01), Izu et al.
"Radiant Heat Applications Unlimited", Fostoria Corporation, Fostoria, Ohio, Apr. 1961, p. 17.

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