Apparatus for uniformly distributing plasma over a substrate

Details Apparatus for uniformly distributing plasma over a substrate Apparatus for uniformly distributing plasma over a substrate

1987-09-03

1990-01-16

Paschall, M. H.

Electric heating

Metal heating

By arc

21912142, 156345, 2041921, B23K 900

Patent

active

048945102

ABSTRACT:
In a plasma processor having a plasma generation portion which generates a plasma through electron cyclotron resonance, and a plasma reaction portion which receives therein a substrate to be processed with the plasma; the improvement comprising the fact that the plasma generation portion includes a plasma generating glass tube which can supply a plasma generating gas, an r.f. waveguide which accommodates the plasma generating glass tube and which establishes a nonuniform r.f. electric field perpendicular to an axial direction of the plasma generating portion, and a coil assembly which is arranged around the r.f. waveguide and which establishes a nonuniform magnetostatic field in the axial direction, at least a part of the magnetic field of the coil assembly being subjected to a rotational motion or a rectilinear motion.

REFERENCES:
patent: 4430138 (1984-02-01), Suzuki et al.
patent: 4600492 (1986-07-01), Ooshio et al.
patent: 4624767 (1986-11-01), Obinata
patent: 4631106 (1986-12-01), Nakazato et al.
patent: 4714536 (1987-12-01), Freeman et al.

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