Apparatus for uniformly baking substrates such as photomasks

Details Apparatus for uniformly baking substrates such as photomasks Apparatus for uniformly baking substrates such as photomasks

2005-06-21

2005-06-21

Lamb, Brenda A. (Department: 1734)

Coating apparatus

With heat exchange, drying, or non-coating gas or vapor...

C118S500000

Reexamination Certificate

active

06908511

ABSTRACT:
A method and apparatus for baking a film onto a substrate. A film, such as a layer of photoresist, is disposed on a first surface of a substrate while a second surface is exposed to a liquid bath. The liquid bath is maintained at a pre-selected temperature. Exposure of the substrate to the liquid bath allows the film on the opposite surface to bake. The liquid bath is then re-circulated to maintain a constant and uniform temperature gradient across the substrate.

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