Apparatus for uniform chemical vapor deposition

Details Apparatus for uniform chemical vapor deposition Apparatus for uniform chemical vapor deposition

1984-02-27

1986-12-30

Lacey, David L.

Coating apparatus

Gas or vapor deposition

With treating means

118730, 156613, 156DIG64, C23C 1624

Patent

active

046320580

ABSTRACT:
A vertical reactor for chemical vapor deposition having an H.sub.1 /D.sub.1 ratio in the range of 1.10 to 1.40, where H.sub.1 is the height of the reactor bell jar enclosure above the susceptor and D.sub.1 is the diameter of the susceptor. Reactor performance is further improved by extending the outermost coil of the induction coil heating the susceptor beyond the outer diameter of the susceptor and by extending the innermost coil of the induction coil within the inner diameter of the susceptor.

REFERENCES:
patent: 3717439 (1973-02-01), Sakai
patent: 3845738 (1974-11-01), Burkman et al.
patent: 4430959 (1984-02-01), Ebata et al.

Affiliated with

Also associated with

Rating

Apparatus for uniform chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for uniform chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for uniform chemical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1540936