Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-04-29
1987-05-19
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041821, 2041828, 2041829, G01N 2726
Patent
active
046665811
ABSTRACT:
This invention relates to an apparatus for two-dimensional electrophoresis which comprises a supporting plate fixed to a rotary axis, a support for first dimension electrophoresis disposed on the supporting plate and a support for second dimension electrophoresis disposed on another supporting plate. Both the supports are arranged in such a fashion that when the rotary axis is rotated, the support for the first dimension electrophoresis comes on the support for the second dimension electrophoresis or reaches a predetermined position in the support for the second dimension electrophoresis. This arrangement can shift the support for the first dimension electrophoresis to the support for the second dimension electrophoresis without damaging the former.
REFERENCES:
patent: 4297198 (1981-10-01), Ohashi et al.
patent: 4305799 (1981-12-01), Schwarz et al.
Ishikawa Isao
Itoh Michio
Okano Kazunori
Yoshida Motoko
Hitachi , Ltd.
Leader W. T.
Niebling John F.
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