Liquid purification or separation – With gas separator
Patent
1994-09-12
1996-11-12
Nessler, Cynthia L.
Liquid purification or separation
With gas separator
210192, 210266, 210259, 210900, C02F 142, C02F 172, C02F 302
Patent
active
055736629
ABSTRACT:
An apparatus for the treatment of a low-concentration organic waste water for relaim a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm and obtaining an ultra pure water having a TOC concentration of not more than 1 ppb is characterized by the fact that a first treating system comprising a reverse osmosis unit for transforming a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm into a low-concentration organic waste water having a TOC concentration of from 60 to 200 ppb and a vacuum degasifier adapted to admit an inert gas at a volumetric feed flow rate in the range of from 0.001 to 1.0 based on the volume of the waste water under treatment at a vacuum rate of not more than 35 Torrs and a second treating system comprising a low-pressure ultraviolet decomposition unit for emitting an ultraviolet light of a wavelength of 184.9 nm and an ion-exchange column are disposed along the flow path of the waste water sequentially in the order mentioned. This apparatus operates with a reduction in both initial cost and running cost because it uses a vacuum degasifier of low running cost with high efficiency and also uses a low-pressure ultraviolet irradiating unit which costs less than the high-pressure ultraviolet irradiating unit, requires no large space for installation, and manifests high efficiency of TOC decomposition. It is easy to manage as compared with the apparatus which is operated by a method resorting to an aerobic microorganism.
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Arthur J. Ackerman, and Russ W. Dahmer, Microcontamination 92 Conference Proceeding, "Ultra Pure Water System Design To Meet Semi Conductor Manufacturing Requirements". pp. 729-738; Oct., 1992; Best Available Technology to Meet Current Semi Conductor Manufacturing Requirements, p. 736.
Abe Mitsugu
Ojima Senri
Nessler Cynthia L.
Nomura Micro Science Co., Ltd.
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