Gas separation – With nonliquid cleaning means for separating media – With heating or cooling means
Reexamination Certificate
1998-05-04
2001-01-09
Spitzer, Robert (Department: 1724)
Gas separation
With nonliquid cleaning means for separating media
With heating or cooling means
C055S282500, C055S295000, C422S173000
Reexamination Certificate
active
06171353
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a closed type of apparatus for treating waste gases, such as poison gases which are discharged during the manufacturing of semiconductor.
2. Description of the Prior Art
In general, amount of gases with poison, combustibility, and causticity are use for a processing of manufacturing semiconductor. Silane, dichloride silane, ammonia, oxidized nitrogen, arsine, phosphine, diboron, boron, and trichloride are used for a process of a chemical vapor deposition. In the processing of manufacturing semiconductors, some of them are used in the processing and the waste gases of them with high density of poison are discharged into ambience.
Also, various of waste gases with poison is created during the processing of a lower pressure chemical vapor deposition, a plasma chemical vapor deposition, a plasma etching, an epitaxy vapor deposition.
The treatment of the waste gases is very important thing relating to the environments. In recent, the law relating to the environments provides that poison must be removed from the waste gases before discharging the waste gases into the ambience.
Various efforts have been tried to treat the waste gases which are discharged during the processing of manufacturing semiconductors, but the apparatus for treating the waste gases cannot achieve a satisfactory performance and effect and have a lot of defection.
FIG. 1
is a perspective view of a wet type of an apparatus for treating waste gases according to an embodiment of the conventional art, which is partially cut.
The wet type of the apparatus for treating waste gases according to the embodiment of the conventional art includes an inlet chamber
220
in which the discharged waste gases and air flow, a heating chamber
204
which is mounted in a lower portion of the inlet chamber
220
, for heating a mixture of the waste gases and air, a mixing chamber
208
which is positioned at a lower portion of the heating chamber
204
, for mixing water and high temperature of the mixed gases, a waste gases collecting tube
207
which is mounted on the bottom of the mixing chamber
208
, and a drain
209
for discharging the collected substrates out of the tube
207
.
In the wet type of the apparatus for treating the waste gases, the waste gases pass through an inlet pipe
201
for the waste gases and move to an inlet pipe
202
for air during the processing of collecting poisonous components.
The mixed waste gases are heated by a heating coil
205
installed in a heating chamber. The heating coil is mounted on an inner surface of a wall of the heating chamber. Water is sprayed through a nozzle
206
of an inlet pipe
203
mounted at an upper portion of the mixing chamber
208
. Then, the high temperature of the mixing gases reacts with water and the poisonous components are separated into a solid component and liquid component. Thus, gases without poison are discharged through discharging pipe
210
out of the mixing chamber
208
and solid component and liquid component are discharged through the drain
209
out of the mixing chamber
208
.
FIG. 2
is a perspective view of a dry type of an apparatus for treating waste gas according to another embodiment of the conventional art.
The dry type of the apparatus for treating waste gases includes a mixing section
303
, a combustion chamber
304
which is defined at a lower portion of the mixing section, a drawing chamber
305
which is defined under the combustion chamber
304
, a collecting container
308
for collecting a drawn substrate, and a cover
309
which encloses the mixing section
303
, the combustion chamber
304
, the drawing chamber
305
, and the collecting container
308
, for absorbing air for cooling therein, for mixing the air and purified gases, and for introducing the mixed gases into a duct.
In the apparatus for treating the waste gases, after the waste gases which are introduced through an inlet pipe
301
into the apparatus, are mixed with fuel in a gas phase such as a liquified natural gas and a liquified propane gas which is introduced through an inlet
302
for fuel in gas phase into the apparatus and are transmitted to the combustion chamber
304
, the mixture of the waste gases and the fuel is combusted in the combustion chamber
304
by a combustor (not shown).
At this time, poison component of the waste gases, for example silane, is combusted with oxygen or air to create silicon dioxide particles. The particles are very fine and are moved along the wall of the drawing chamber
305
by a conical guide
306
which is rotated by a motor
311
in the drawing chamber
305
to be collected in the collecting container
308
.
The combusted and purified gases
315
are mixed with the cooling air
307
which is introduced through space
316
between the cover
309
and the collecting container
308
and are transmitted through space between the cover and the drawing chamber
313
to a duct
314
. Then, the purified gases
315
are filtered in the duct
314
and discharged to outside. A reference numeral
310
which is not described indicates a scraper which makes a dust
312
detached from the inner surface of the drawing chamber
305
.
In the dry type of the apparatus for treating the waste gases according to the conventional art, however, the drawn fine particles cause the combuster to have out of order. A combustible gases with explosiveness are used in the apparatus for treating the waste gases. The apparatus for treating the waste gases is an open type and a cooling air is introduced from outside therein. Accordingly, there are disadvantages in that it is difficult to manage the apparatus for treating the waste gases and a consumption of fuel increases in a view of economy.
In the dry type of the apparatus for treating the waste gases, there is another disadvantage in that even if the dust attached on the inner surface of the drawing chamber
313
is removed by the scraper, the dust attached on the inner surface of the cover cannot be removed, thereby a lot of time and persons are needed for removing the dust attached on the inner surface of the cover.
SUMMARY OF THE INVENTION
The present invention has been made to overcome the above described problem of the prior art. It is an object of the present invention to provide an apparatus for treating waste gases in which an explosion of a combustion gases is prevented in such a manner that the waste gases and reaction gases are mixed, thereby heating the mixed gases at a predetermined temperature.
It is another object of the present invention to provide an apparatus for treating waste gases in which fine dusts attached to an inner surface of a waste gases collecting chamber cover and a bottom surface of a lower trap.
To accomplish the above object of the present invention, there is provided an apparatus for treating waste gases comprising:
a waste gases heating chamber for heating the waste gases mixed with air so as to separate a solid phase-reacted product and a gas phase-purified gas;
a waste gases collecting chamber which is connected to the waste gases heating chamber, for collecting the heated and reacted products and the purified gases by condensing and cooling the products and the gases;
a cover of the waste gases collecting chamber which is spaced at predetermined distance from the waste gases collecting chamber and tightly closes the waste gases collecting chamber, for collecting and delivering the rest of the reacted products and the purified gases in the waste gases collecting chamber;
a first scraping device for removing by-products attached to an inner surface of the cover of waste gases collecting chamber;
a second scraping device for removing by-products attached to an inner surface of the waste gases collecting chamber; and
a driving source for driving the first scraping device and the second scraping device.
The waste gases collecting chamber includes a first cylindrical body, a chamber flange which is formed at one end of the first body and is combined with the waste gases heating chamber, a s
Kim Hyung-ryul
Park Young-Bae
Dann Dorfman Herrell and Skillman
Skillman Henry H.
Spitzer Robert
Union Industry Co., Ltd.
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