Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-09-22
2010-11-16
Kackar, Ram N (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345330, C156S345340
Reexamination Certificate
active
07833350
ABSTRACT:
An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate between the top and bottom plates and having a first gas path communicating with the retention space and a second gas path communicating with the pump holes; an energy source facing the top plate such that light emitted therefrom irradiates a part of the substrate through the retention space; a reaction gas supplier connected to the first gas path; and a pressure adjusting device connected to the second gas path.
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Webster's New World Dictionary, The World Publishing Co., 1972, p. 617.
Lee Je-Sup
Lee Jong-Chul
Park Sang-Hyuck
Brinks Hofer Gilson & Lione
Chandra Satish
Kackar Ram N
LG. Display Co. Ltd.
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