Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-08-30
2005-08-30
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230AN, C118S724000, C156S345370, C156S348000
Reexamination Certificate
active
06935269
ABSTRACT:
The present invention relates to an apparatus for treating the surface with neutral particle beams comprising an antenna container, a plasma generating part, a neutral particle beam generating part and a treating part, wherein the antenna container comprises antennas connected to high frequency electric power supply through which high frequency electric power supplies, the plasma generating part transfers gases from a gas injector into plasmas with the supplied power, the neutral particle beam generating part reverts the obtained plasmas to neutral particle beams via the collision thereof with metal plates, and the treating part treats the surface of a target with the neutral particle beams.
REFERENCES:
patent: 4662977 (1987-05-01), Motley et al.
patent: 4891095 (1990-01-01), Ishida et al.
patent: 5282899 (1994-02-01), Balmashnov et al.
patent: 5468955 (1995-11-01), Chen et al.
patent: 5690050 (1997-11-01), Doi
patent: 5792261 (1998-08-01), Hama et al.
patent: 6132552 (2000-10-01), Donohoe et al.
patent: 6162323 (2000-12-01), Koshimizu
patent: 6326597 (2001-12-01), Lubomirsky et al.
patent: 62-185324 (1987-08-01), None
Lee Bong-Ju
Yoo Suk-Jae
Bachman & LaPointe P.C.
Hag-Joo Lee
Hassanzadeh Parviz
Moore Karla
Sem Technology Co., Ltd.
LandOfFree
Apparatus for treating the surface with neutral particle beams does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for treating the surface with neutral particle beams, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for treating the surface with neutral particle beams will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3460564