Apparatus for treating substrates with an ion beam

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250398, 250443, H01J 3700

Patent

active

041550110

ABSTRACT:
An apparatus for treating a substrate with an ion beam comprising a closed ousing which defines a substantially evacuatable chamber, a drum having a circumferential portion with an annular inside surface rotatably mounted in the chamber, drive means connected to the drum for rotating it at a selected speed to establish a centrifugal force toward the annular inside surface of the drum and ion beam generating means associated with the housing for directing an ion beam into the chamber and toward the annular inside surface. A substrate is supportable on the inside surface of the drum and conforms with the surface so as to be closely associated therewith under the influence of the centrifugal force. This association establishes a thermally conductive relationship between the substrate and the circumferential portion so that heat generated in the substrate due to the ion beam can be dissipated through the circumferential portion of the drum.

REFERENCES:
patent: 3168646 (1965-02-01), Busch et al.
patent: 3689766 (1972-09-01), Freeman
patent: 3778626 (1973-12-01), Robertson
patent: 3920233 (1975-11-01), Stuckert
patent: 3930163 (1975-12-01), Gerlach et al.

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