Apparatus for treating substrates in a vacuum chamber

Details Apparatus for treating substrates in a vacuum chamber Apparatus for treating substrates in a vacuum chamber

1994-01-21

1995-11-21

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118720, 118721, 156345, 20429828, C23C 1434

Patent

active

054683629

ABSTRACT:
A vacuum chamber houses a rotatable substrate holder next to a door having a cathode target mounted therein. A plate-like mask is movable to a position between the substrate holder and the door so that the target can be cleaned without contaminating the substrate. The mask is preferably moved by a screw jack including a tube driven through a sealed hole in the chamber wall.

REFERENCES:
patent: 4278528 (1981-07-01), Kuehnle et al.
patent: 4422896 (1983-12-01), Class et al.
patent: 4525262 (1985-06-01), Class et al.
patent: 4572842 (1986-02-01), Dietrich et al.
patent: 4595483 (1986-06-01), Mahler
patent: 5223112 (1993-06-01), Tepman

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