Apparatus for treating silicon wafers in an acid bath

Details Apparatus for treating silicon wafers in an acid bath Apparatus for treating silicon wafers in an acid bath

1989-10-24

1991-04-02

Coe, Philip H.

Cleaning and liquid contact with solids

Apparatus

With heating, cooling or heat exchange means

134902, 219523, 392453, B08B 310, H05B 306

Patent

active

050039997

ABSTRACT:
An apparatus for treating silicon wafers in an acid bath, comprising at least one advantageously quartz tank (1) for containing an acid in which the wafers are immersed and with which electrical resistors (14) are associated for heating the acid, the tank (1) being positioned during use in a usual process bench or wet hood (3). The tank (1) comprises tubular ducts (5), advantageously of quartz, which are closed at one end (6) and positioned transversely in the tank (1), and which open at (7) into one of its sides (8), the tubular ducts (5) being arranged to removably receive the electrical resistors (14), which are removably connected to the process bench.

REFERENCES:
patent: 1222426 (1917-04-01), Lepper
patent: 1754080 (1930-04-01), Briggs et al.
patent: 2274445 (1942-02-01), Greer
patent: 2860226 (1958-11-01), Williams et al.
patent: 3546431 (1970-12-01), Gibbs
patent: 3983361 (1976-09-01), Wild et al.
patent: 4408117 (1983-10-01), Yurkanin
patent: 4593178 (1986-06-01), Banta et al.

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