Apparatus for treating semiconductor wafers

Details Apparatus for treating semiconductor wafers Apparatus for treating semiconductor wafers

1985-06-24

1987-01-06

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134102, 134114, 134201, 366338, B08B 304

Patent

active

046338934

ABSTRACT:
An improved apparatus for enclosed flow-line semiconductor wafer treatment includes a wafer-containing vessel and a mechanism for imparting plug-flow to a treatment fluid flowing into the vessel. One plug-flow imparting mechanism includes a flow-expansion input element and a fixed helical flow-diverting surface. Another mechanism incorporates a rotating flow diverting surface.

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