Apparatus for treating photoresists

Photocopying – Projection printing and copying cameras – Illumination systems or details

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355 53, G03B 2772

Patent

active

048413429

ABSTRACT:
Ultraviolet radiation process applicable in the manufacture of semiconductor devices to enhance the thermal stability of a photoresist film on a semiconductor wafer.
A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of a photoresist pattern employing ultraviolet irradiation by preventing the deformation of the photoresist which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. This method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the photoresist pattern, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the photoresist out of radiant energy obtained from the discharge lamp.

REFERENCES:
patent: 3573456 (1971-04-01), Beeh
patent: 4589769 (1986-05-01), Matsuki
patent: 4732842 (1988-03-01), Kira

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