Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-04-02
1991-08-06
Kalafut, Stephen J.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204308, H05B 3106, B01D 1302
Patent
active
050375245
ABSTRACT:
A method and apparatus are disclosed for efficient endothermic processing of liquids and the precipitation of dissolved elements and chemical compounds. Improvements over prior systems include system layout, components and modes of operation of the system. Applications of the system include destruction of toxic wastes and sewage treatment, precipitation of chemical compounds and elements including metals from solution (brine, sea water, industrial waste), sterilization and water purification, catalytic formation of chemical compounds, and processing of hydrocarbons.
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patent: 4153527 (1979-05-01), Greenewald
patent: 4664767 (1987-05-01), Kudo et al.
patent: 4917785 (1990-04-01), Juvan
Freiburger Thomas M.
Kalafut Stephen J.
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